Leaf-type IR furnace
Capable of atmosphere processing! An IR furnace that can also handle severe clean environments.
It is a single-wafer IR furnace. 【Features】 ◆ High-level cleanliness With a clean structure that does not generate self-dust, it has high cleanliness performance. It can also handle processing of array substrates that require a stringent clean environment. ◆ High heating efficiency Adopting an infrared (IR) heating method with excellent heating efficiency, it enables high-efficiency processing for various film thicknesses. It is optimal for processing thick films such as orientation films and passivation films. ◆ Excellent temperature uniformity Equipped with IR panel heaters that excel in temperature uniformity, it can provide uniform heating even for large substrates such as 10th generation. ◆ Atmosphere processing capability It is possible to introduce nitrogen gas into the furnace for heating treatment at low oxygen concentrations.
- Company：ジェイテクトサーモシステム
- Price：Other
